Fashion and technology brands collaborate to search for an innovative stylist


(L-R) Grand winner Sidney Yap's (center) models surrounded fashion designers Randy Ortiz, JC Buendia and product endorser Joseph Marco during the awarding ceremony of the Bench and O+ styling competition at Glorietta 1 Acvitity Center in Makati City last December 2.


Six fashion stylists showed the importance of technology in their field in a competition prepared by collaborating clothing and technology brands.

Bench and O+, the US-born mobile technology brand, invited fashion stylists Sidney Yap, Adrianne Concepcion, Edlene Cabral, Macky Combe, Myrrh Lao To and Kate Paras in a challenge that would show their creative talent in styling.

Each of them was asked to produce five coherently-styled looks using the clothing brand’s products. Mobile gadgets were also provided for them to take quick snaps of the clothes for proper matching.

Their models then walked the ramp at a fashion show held last Sunday, December 2, at the Glorietta 1 Activity Center in Makati City.

The creations were judged by distinguished guests from the fashion industry.

These include fashion designers JC Buendia and Randy Ortiz, lifestyle editors Liza Ilarde and JJ San Juan, Preview creative director Vince Uy, PMAP president Phoemela Barranda, and Bench endorser Joseph Marco.

Among the six contenders, three stylish groups stood out.

On the third place, Edlene Cabral made an impression with her army-inspired look for her models.

Second placer Adrianne Concepcion, on the other hand, used red plaids on her models to catch the attention of the judges.

Grand winner Sidney Yap, meanwhile, showed how simple striped pieces could be fashionable by pairing these with different styles of clothing.

Aside from the fashion show, Bench and O+ mounted a sale on selected fashion items and tech gadgets during the day.

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